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Investigations of ultra shallow junction ion implanted biaxial tensile strained silicon by means of X-Ray, Raman and photoacoustic techniques

Investigations of ultra shallow junction ion implanted biaxial tensile strained silicon by means of X-Ray, Raman and photoacoustic techniques

Horan, Ken

Thesis. English.
Published Dublin City University. School of Electronic Engineering, 2012

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Details

Statement of responsibility: Ken Horan
Dissertation note: Thesis (PhD) -- Dublin City University, 2012
Physical Description: 236 p. : ill. ; 30 cm.
Subject: Semiconductors; Acoustical engineering; Electronic engineering; Materials; Nanotechnology