Skip to Content
Semiconductor material and device characterization

Semiconductor material and device characterization

Schroder, Dieter K

This detailed sourcebook provides an up-to-date description and unified treatment of the characterization techniques used in the semiconductor industry. It covers electrical, optical, electron- beam, ion-beam, X-ray and gamma ray methods.;This information, until now scattered in journals and review papers, is presented in a unified manner with over 1300 references. It is also a valuable reference book on characterization methods

Book. English.
Published New York: Wiley, c1990

Available at O'Reilly Library.

This item is not reservable because:

  • There are no reservable copies for this title. Please contact a member of library staff for further information.
  • O'Reilly Library – One available in Main Collection 621.38152/SCH

    Barcode Shelfmark Loan type Status
    900653108 Main Collection 621.38152/SCH 3 Weeks Available

Details

Statement of responsibility: Dieter K. Schroder
ISBN: 0471511048, 9780471511045
Note: Includes bibliographical references and index.
Note: "A Wiley-Interscience publication."
Physical Description: xv, 599 p : ill. ; 25 cm.
Subject: Semiconductors.; Semiconductors Testing.

Contents

  1. Resistivity.
  2. Carrier and Doping Concentration.
  3. Contact Resistance and Schottky Barrier Height.
  4. Series Resistance, Channel Length, Threshold Voltage.
  5. Mobility.
  6. Oxide and Interface Trapped Charge.
  7. Deep–Level Impurities.
  8. Carrier Lifetime.
  9. Optical Characterization.
  10. Chemical and Physical Characterization.
  11. Appendixes.
  12. Index.